Product Application This product is primarily used to prepare thin-film materials via
liquid-phase methods—such as the sol-gel process—under a nitrogen
atmosphere. A clean, dry substrate is immersed in a solution (sol);
using preset parameters, the substrate is then vertically withdrawn
at a controlled speed. This process deposits a layer known as a
"wet gel film" onto the substrate. As the solvent evaporates from
this layer, it solidifies into a "dry gel film." Subsequent drying
and high-temperature heat treatment transform the dry gel film into
the final desired nano-thin-film material. Film thickness is
determined by the withdrawal speed, solution concentration, and
solution viscosity. Product Introduction The Nitrogen-Protected Dip-Coating Machine is specifically
designed for research involving the preparation of thin-film
materials via liquid-phase methods (particularly the sol-gel
process) under a nitrogen atmosphere. The vertical withdrawal
mechanism is housed within a sealed chamber, which features a
nitrogen inlet and a pressure control system on its sidewall.
During the coating process, the solution is placed inside the
chamber, and the substrate is secured to the withdrawal mechanism.
The chamber is filled with nitrogen (the nitrogen intake can be
adjusted to control internal humidity), and after setting the
coating parameters, the dip-coating process proceeds under the
protection of the nitrogen atmosphere. It is suitable for thin-film
materials that are prone to oxidation or are sensitive to humidity.
Inert gases, such as argon, can also be used instead of nitrogen.
Parameters such as withdrawal speed, withdrawal height, immersion
time, number of coating cycles (for multi-layer coating), and
coating intervals are continuously adjustable and precisely
controlled. There are no special requirements for the coating
substrate; materials in sheet, block, or cylindrical forms can all
be coated. The system operates stably with no vibration at the
liquid surface during operation, significantly enhancing
experimental precision and efficiency. It is suitable for surface
coating processes on a wide range of solid materials, including
silicon wafers, crystal wafers, glass, ceramics, and metals. It is
applicable to both scientific research and industrial production. Product Features of the Nitrogen-Protected Dip-Coating Machine 1. The lifting mechanism and program control system utilize
components imported from Taiwan and Germany, ensuring operational
precision and stability. 2. Fully automatic program control with
multiple parameters. Six parameters can be configured—descent
speed, immersion time, lifting speed, coating length, number of
coating cycles, and interval time—all of which are continuously
adjustable for precise control. 3. Once the coating program is set,
the entire process—from descent and immersion to the
lifting/coating phase—runs fully automatically. 4. Smooth operation
at both high and low speeds; the liquid surface remains undisturbed
during coating, resulting in a uniform film free of streaks. 5. A
4.3-inch LCD touchscreen facilitates easy control. Parameters are
displayed in real-time during operation, providing a clear view of
the coating progress. 6. Limit sensors are installed at both the
top and bottom positions; the machine automatically stops upon
reaching these limits, preventing over-travel during lifting or
descent. 7. Features a uniquely designed flat-jaw clamp that grips
the sample evenly from both sides without causing damage.
8.Equipped with a high-precision nitrogen sensor and a unique
nitrogen-saving system, resulting in very low nitrogen consumption.
